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Chemical Vapor Deposition of Alumina Thin Films Utilizing Novel Precursor Methodology

Bradley D Fahlman

https://www.cmich.edu/academics/colleges/college-science-engineering/departments-schools/chemistry-and-biochemistry
Science of Advanced Materials

Research output: Other contribution

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Original language	English
State	Published - Jul 18 1999

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Fahlman, B. D. (1999, Jul 18). Chemical Vapor Deposition of Alumina Thin Films Utilizing Novel Precursor Methodology.

Fahlman, Bradley D. / Chemical Vapor Deposition of Alumina Thin Films Utilizing Novel Precursor Methodology. 1999.

@misc{cdf1e15bc6194bcc8a602a3475b55d68,

title = "Chemical Vapor Deposition of Alumina Thin Films Utilizing Novel Precursor Methodology",

author = "Fahlman, {Bradley D}",

year = "1999",

month = jul,

day = "18",

language = "English",

type = "Other",

}

Fahlman, BD 1999, Chemical Vapor Deposition of Alumina Thin Films Utilizing Novel Precursor Methodology..

Chemical Vapor Deposition of Alumina Thin Films Utilizing Novel Precursor Methodology. / Fahlman, Bradley D.
1999.

Research output: Other contribution

TY - GEN

T1 - Chemical Vapor Deposition of Alumina Thin Films Utilizing Novel Precursor Methodology

AU - Fahlman, Bradley D

PY - 1999/7/18

Y1 - 1999/7/18

M3 - Other contribution

ER -

Fahlman BD. Chemical Vapor Deposition of Alumina Thin Films Utilizing Novel Precursor Methodology. 1999.

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