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Chemical Vapor Deposition of Aluminum Oxide Thin Films

Bradley D Fahlman

https://www.cmich.edu/academics/colleges/college-science-engineering/departments-schools/chemistry-and-biochemistry
Science of Advanced Materials

Research output: Other contribution

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Original language	English
Publisher	CHM 331
State	Published - Oct 2004

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Fahlman, B. D. (2004, Oct). Chemical Vapor Deposition of Aluminum Oxide Thin Films. CHM 331.

Fahlman, Bradley D. / Chemical Vapor Deposition of Aluminum Oxide Thin Films. 2004. CHM 331.

@misc{45ef150772b046e88f27b1f13ff9b814,

title = "Chemical Vapor Deposition of Aluminum Oxide Thin Films",

author = "Fahlman, {Bradley D}",

year = "2004",

month = oct,

language = "English",

publisher = "CHM 331",

type = "Other",

}

Fahlman, BD 2004, Chemical Vapor Deposition of Aluminum Oxide Thin Films. CHM 331.

Chemical Vapor Deposition of Aluminum Oxide Thin Films. / Fahlman, Bradley D.
CHM 331. 2004.

Research output: Other contribution

TY - GEN

T1 - Chemical Vapor Deposition of Aluminum Oxide Thin Films

AU - Fahlman, Bradley D

PY - 2004/10

Y1 - 2004/10

M3 - Other contribution

PB - CHM 331

ER -

Fahlman BD. Chemical Vapor Deposition of Aluminum Oxide Thin Films. 2004.

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