Dependence of silicon-on-insulator waveguide loss on lower oxide cladding thickness

Adam Mock, John D. O'Brien

Research output: Contribution to journalConference articlepeer-review

Abstract

Silicon-on-insulator waveguide propagation and bending loss as a function of lower oxide cladding thickness is investigated using the finite-difference time-domain method. Certain non-rectangular waveguide cross-sections can reduce substrate loss.

Original languageEnglish
JournalOptics InfoBase Conference Papers
StatePublished - 2008
EventIntegrated Photonics and Nanophotonics Research and Applications, IPNRA 2008 - Boston, MA, United States
Duration: Jul 13 2008Jul 16 2008

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