Skip to main navigation
Skip to search
Skip to main content

Central Michigan University Home

Home
Profiles
Research units
Core Facilities & Equipment
Grants
Research, Presentations & Patents
Honors & Awards
Activities
Press/Media

Search by expertise, name or affiliation

Dissertation title: Chemical Vapor Deposition of Alumina-Based Thin Films

Bradley D Fahlman

Chemistry & Biochemistry
Science of Advanced Materials

Research output: Other contribution

Overview
Fingerprint

Original language	English
State	Published - 2000

Fingerprint

Dive into the research topics of 'Dissertation title: Chemical Vapor Deposition of Alumina-Based Thin Films'. Together they form a unique fingerprint.

View full fingerprint

Cite this

APA
Author
BIBTEX
Harvard
Standard
RIS
Vancouver

Fahlman, B. D. (2000). Dissertation title: Chemical Vapor Deposition of Alumina-Based Thin Films.

Fahlman, Bradley D. / Dissertation title: Chemical Vapor Deposition of Alumina-Based Thin Films. 2000.

@misc{00f291cea08f4dee93a8f5b5bba23192,

title = "Dissertation title: Chemical Vapor Deposition of Alumina-Based Thin Films",

author = "Fahlman, {Bradley D}",

year = "2000",

language = "English",

type = "Other",

}

Fahlman, BD 2000, Dissertation title: Chemical Vapor Deposition of Alumina-Based Thin Films..

Dissertation title: Chemical Vapor Deposition of Alumina-Based Thin Films. / Fahlman, Bradley D.

2000.

Research output: Other contribution

TY - GEN

T1 - Dissertation title: Chemical Vapor Deposition of Alumina-Based Thin Films

AU - Fahlman, Bradley D

PY - 2000

Y1 - 2000

M3 - Other contribution

ER -

Fahlman BD. Dissertation title: Chemical Vapor Deposition of Alumina-Based Thin Films. 2000.

Powered by Pure, Scopus & Elsevier Fingerprint Engine™ © 2023 Elsevier B.V

We use cookies to help provide and enhance our service and tailor content. By continuing you agree to the use of cookies

Central Michigan University data protection policy

About web accessibility