Electrochemical etching and characterization of sharp field emission points for electron impact ionization

Tyler L. Van Well, Matthew Redshaw, Nadeesha D. Gamage, R. M.Eranjan B. Kandegedara

Research output: Contribution to journalArticlepeer-review

Abstract

A new variation of the drop-off method for fabricating field emission points by electrochemically etching tungsten rods in a NaOH solution is described. The results of studies in which the etching current and the molarity of the NaOH solution used in the etching process were varied are presented. The investigation of the geometry of the tips, by imaging them with a scanning electron microscope, and by operating them in field emission mode is also described. The field emission tips produced are intended to be used as an electron beam source for ion production via electron impact ionization of background gas or vapor in Penning trap mass spectrometry applications.

Original languageEnglish
Article numbere54030
JournalJournal of Visualized Experiments
Volume2016
Issue number113
DOIs
StatePublished - Jul 12 2016

Keywords

  • Cold Cathode Emitter
  • Electrochemical Etching
  • Electron Beam
  • Electron Impact Ionization
  • Engineering
  • Field Emission
  • Issue 113
  • Mass Spectrometry
  • Penning Trap

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