We report the deposition of aluminum oxide and aluminosilicate thin films onto carbon fiber substrates, at temperatures of 200 and 250°C, respectively. For aluminosilicate films, the Al/Si ratio of the resultant film varied concomitantly with the composition of the liquid precursor mixture. The growth rate for the oxide films was 15-17 Å/min, comparable with other methods carried out at higher temperatures. Cross-section SEM images indicate that the deposited films are conformal, following the complex topography of the carbon fiber substrate. Preliminary gas-phase IR analysis suggests that the coatings decompose the nerve agent simulant dimethyl methylphosphonate at temperatures as low as 35°C, suggesting the utility of the reported methodology for the design/fabrication of actively protective fabrics and clothing.