On the throughput of clustered photolithography tools: Wafer advancement and intrinsic equipment loss

James R. Morrison, Maruthi Kumar Mutnuri

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

For clustered photolithography tools we develop two analytic models characterizing the throughput. The models are essentially distinguished by the manner in which wafers advance through the tool and allow for many important features present in practical manufacturing systems. Such features include a diversity of lot populations (with different process times at each module) and disturbances to the ideal processing behavior such as delays to begin processing and delays incurred at specific modules. Our models thus allow us to quantify important classes of intrinsic equipment loss.

Original languageEnglish
Title of host publicationProceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
Pages88-93
Number of pages6
DOIs
StatePublished - 2007
Event3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007 - Scottsdale, AZ, United States
Duration: Sep 22 2007Sep 25 2007

Publication series

NameProceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007

Conference

Conference3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
Country/TerritoryUnited States
CityScottsdale, AZ
Period09/22/0709/25/07

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