Performance evaluation of serial photolithography clusters: Queueing models, throughput and workload sequencing

James R. Morrison, Beverly Bortnick, Donald P. Martin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

For clustered configuration of a photolithography toolset, operating under a scheduling policy inducing serial processing, measures of system performance are deduced. Queueing models demonstrate that, due to the parallelism inherent in the system configuration, the normalized cycle time behavior is different than that of the standard single server queue. Cluster throughput is evaluated based on measures of the frequency and magnitude of events common in manufacturing operation. It is shown that the maximum throughput of a serial photolithography cluster tool is not influenced by the order in which two classes of lots with different wafer processing speeds are processed.

Original languageEnglish
Title of host publication17th Annual SEMI/IEEE Advanced Semiconductor Manufacturing Conference, ASMC 2006
Pages44-49
Number of pages6
DOIs
StatePublished - 2006
Event17th Annual SEMI/IEEE Advanced Semiconductor Manufacturing Conference, ASMC 2006 - Boston, MA, United States
Duration: May 22 2006May 24 2006

Publication series

NameASMC (Advanced Semiconductor Manufacturing Conference) Proceedings
Volume2006
ISSN (Print)1078-8743

Conference

Conference17th Annual SEMI/IEEE Advanced Semiconductor Manufacturing Conference, ASMC 2006
Country/TerritoryUnited States
CityBoston, MA
Period05/22/0605/24/06

Keywords

  • Cluster tools
  • Cycle time
  • Photolithography performance evaluation
  • Queueing models
  • Throughput
  • Workload sequencing

Fingerprint

Dive into the research topics of 'Performance evaluation of serial photolithography clusters: Queueing models, throughput and workload sequencing'. Together they form a unique fingerprint.

Cite this